Surface structures of erbium silicide ultra-thin films formed by solid phase epitaxy on Si(1 0 0)

Gang Chen, Jun Wan, Jianshu Yang, Xunming Ding, Ling Ye, Xun Wang

Research output: Contribution to journalArticlepeer-review

Abstract

The surface structures of thin erbium silicide layers formed on Si(1 0 0) substrate by solid phase epitaxy are studied by using the in situ high energy electron diffraction, low energy electron diffraction, Auger electron spectroscopy, scanning tunneling microscopy, and ex situ grazing X-ray diffraction. Nanowires and nanoislands of Er silicide coexist on the Si substrate surface and a c(2 × 2) reconstruction is observed on the top of these nanostructures. The crystalline structure of the Er silicide nanostructure is found to be tetragonal ErSi2. A Si-adatom model for the c(2 × 2) reconstruction is proposed. The total energy calculation based on the discrete-variational self-consistent multipolar cluster method identifies that the hollow site Si adatom model might be the most energetically favorable one.

Original languageEnglish (US)
Pages (from-to)203-210
Number of pages8
JournalSurface Science
Volume513
Issue number1
DOIs
StatePublished - Jul 1 2002

Keywords

  • Epitaxy
  • Lanthanides
  • Metal-semiconductor interfaces
  • Silicides
  • Surface energy
  • Surface relaxation and reconstruction

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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