Microfabrication of bulk PZT transducers by dry film photolithography and micro powder blasting

I. Misri; P. Hareesh; S. Yang; D. L. Devoe

doi:10.1088/0960-1317/22/8/085017

Microfabrication of bulk PZT transducers by dry film photolithography and micro powder blasting

I. Misri, P. Hareesh, S. Yang, D. L. Devoe

School of Medicine

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

A facile fabrication process for bulk PZT microsystems using dry film photoresist and micro powder blasting is presented. Bulk PZT and dry film photoresist etching characteristics are evaluated as a function of process parameters and mask dimensions using 127m thick PZT substrates. The resulting process simplifies microscale patterning of bulk PZT compared with existing methods, with selection of suitable etching parameter providing excellent etch rate, selectivity and anisotropy. The technique is used to fabricate two different cantilever microactuator topologies based on piezoelectric d ₃₁and d ₃₃mode actuation, demonstrating the capabilities of the patterning method for applications in bulk PZT microelectromechanical systems (MEMS).

Original language	English (US)
Article number	085017
Journal	Journal of Micromechanics and Microengineering
Volume	22
Issue number	8
DOIs	https://doi.org/10.1088/0960-1317/22/8/085017
State	Published - Aug 2012

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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abstract = "A facile fabrication process for bulk PZT microsystems using dry film photoresist and micro powder blasting is presented. Bulk PZT and dry film photoresist etching characteristics are evaluated as a function of process parameters and mask dimensions using 127m thick PZT substrates. The resulting process simplifies microscale patterning of bulk PZT compared with existing methods, with selection of suitable etching parameter providing excellent etch rate, selectivity and anisotropy. The technique is used to fabricate two different cantilever microactuator topologies based on piezoelectric d 31and d 33mode actuation, demonstrating the capabilities of the patterning method for applications in bulk PZT microelectromechanical systems (MEMS).",

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AB - A facile fabrication process for bulk PZT microsystems using dry film photoresist and micro powder blasting is presented. Bulk PZT and dry film photoresist etching characteristics are evaluated as a function of process parameters and mask dimensions using 127m thick PZT substrates. The resulting process simplifies microscale patterning of bulk PZT compared with existing methods, with selection of suitable etching parameter providing excellent etch rate, selectivity and anisotropy. The technique is used to fabricate two different cantilever microactuator topologies based on piezoelectric d 31and d 33mode actuation, demonstrating the capabilities of the patterning method for applications in bulk PZT microelectromechanical systems (MEMS).

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Microfabrication of bulk PZT transducers by dry film photolithography and micro powder blasting

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