High efficiency micromachining system applied in nanolithography

Xing Chen, Dong Weon Lee, Young Soo Choi

Research output: Contribution to journalArticle

Abstract

Scanning probe lithography such as directwriting lithographic processes and nanoscratching techniques based on scanning probe microscopy have presented new micromachining methods for microelectromechanical system (MEMS). In this paper, a micromachining system for thermal scanning probe lithography is introduced, which consists of the cantilever arrays and a big stroke micro XYstage. A large machining area and high machining speed can be realized by combining arrays of cantilevers possessing sharp tips at their top with the novel micro XYstage which can obtain big displacements under relatively low driving voltage and in a small size. According to the above configuration, this micromachining system is provided with high throughputs and suitable for industrialization due to its MEMSbased simple fabrication process. The novel micro XYstage applied in this system is presented in detail including the unique structure and principles, which shows an obvious improvement and distinct advantages in comparison with traditional structures. It is analyzed by mathematical model and then simulated using finite element method (FEM), it is proved to be able to practically serve the micromachining system with high capability.

Original languageEnglish (US)
Pages (from-to)1865-1870
Number of pages6
JournalInternational Journal of Modern Physics B
Volume22
Issue number9-11
StatePublished - Apr 30 2008
Externally publishedYes

Fingerprint

micromachining
machining
scanning
probes
lithography
strokes
low voltage
microelectromechanical systems
mathematical models
finite element method
microscopy
fabrication
configurations

Keywords

  • Heater integrated cantilevers
  • Micro XYstage
  • Thermal lithography

ASJC Scopus subject areas

  • Statistical and Nonlinear Physics
  • Condensed Matter Physics

Cite this

High efficiency micromachining system applied in nanolithography. / Chen, Xing; Lee, Dong Weon; Choi, Young Soo.

In: International Journal of Modern Physics B, Vol. 22, No. 9-11, 30.04.2008, p. 1865-1870.

Research output: Contribution to journalArticle

Chen, X, Lee, DW & Choi, YS 2008, 'High efficiency micromachining system applied in nanolithography', International Journal of Modern Physics B, vol. 22, no. 9-11, pp. 1865-1870.
Chen, Xing ; Lee, Dong Weon ; Choi, Young Soo. / High efficiency micromachining system applied in nanolithography. In: International Journal of Modern Physics B. 2008 ; Vol. 22, No. 9-11. pp. 1865-1870.
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