Eliminating process-related defects during the fabrication of copper interconnects

Minseok Oh, Deepak A. Ramappa, Daniele Contestable-Gilkes, Sailesh M. Merchant, Douglas E. Jones, Karthikeyan Subramanian, Steve Lytle, Isaiah Oladeji, Chim Seng Seet, He Ming Li

Research output: Contribution to journalConference articlepeer-review

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Engineering & Materials Science

Chemical Compounds