Design and evaluation of corner compensation patterns for anisotropic etching

Xing Chen, Dong Weon Lee, Jong Sung Park

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper reports corner compensation methods for fabricating the intact mesa structure in MEMS (Micro-Electro-Mechanical System). To investigate the undercutting problem in the mesa structure, over ten corner compensation patterns are designed by computing the relations among a series of parameters, e.g. etching rates in different crystal planes, etching depth, etching times, etc. The compensation patterns are then simulated by the simulation software Anisotropic Crystalline Etch Simulation (ACES) beta 2, the 3D etching simulations are gotten. Various new compensation structures preventing the undercutting of convex corners of (100) silicon in THAH solution are redesigned and optimized based on the simulation results, the fabrication are conducted to verify the feasibility of the corner compensation patterns.

Original languageEnglish (US)
Title of host publication3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationOptical Test and Measurement Technology and Equipment
DOIs
StatePublished - Dec 1 2007
Event3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment - Chengdu, China
Duration: Jul 8 2007Jul 12 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6723
ISSN (Print)0277-786X

Other

Other3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
CountryChina
CityChengdu
Period7/8/077/12/07

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Chen, X., Lee, D. W., & Park, J. S. (2007). Design and evaluation of corner compensation patterns for anisotropic etching. In 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment [672364] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6723). https://doi.org/10.1117/12.787617