Deriving exposure limits

David H. Sliney

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Historically, many different agencies and standards organizations have proposed laser occupational exposure limits (EL's), or maximum permissible exposure (MPE) levels. Although some safety standards have been limited in scope to manufacturer system safety performance standards or to codes of practice, most have included occupational EL's. Initially, in the 1960's, attention was drawn to setting EL's; however, as greater experience accumulated in the use of lasers and some accident experience had been gained, safety procedures were developed. It became clear by 1971, after the first decade of laser use, that detailed hazard evaluation of each laser environment was too complex for most users, and a scheme of hazard classification evolved. Today, most countries follow a scheme of four major hazard classifications as defined in Document WS 825 of the International Electrotechnical Commission (IEC). The classifications and the associated accessible emission limits (AEL's) were based upon the EL's. The EL and AEL values today are in surprisingly good agreement worldwide. There exists a greater range of safety requirements for the user for each class of laser. The current MPE's (i.e., EL's) and their basis are highlighted in this presentation.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsK.Penelope Galoff, H.David Sliney
PublisherPubl by Int Soc for Optical Engineering
Pages2-13
Number of pages12
Volume1207
ISBN (Print)0819402486
StatePublished - 1990
Externally publishedYes
EventLaser Safety, Eyesafe Laser Systems, and Laser Eye Protection - Los Angeles, CA, USA
Duration: Jan 16 1990Jan 17 1990

Other

OtherLaser Safety, Eyesafe Laser Systems, and Laser Eye Protection
CityLos Angeles, CA, USA
Period1/16/901/17/90

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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  • Cite this

    Sliney, D. H. (1990). Deriving exposure limits. In K. P. Galoff, & H. D. Sliney (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1207, pp. 2-13). Publ by Int Soc for Optical Engineering.